Combining high resolution with outstanding sensitivity, the KAF-09000 image sensor has been specifically designed to meet the needs of next-generation low cost digital radiography and scientific imaging systems. The high sensitivity available from 12-micron square pixels combine with a low noise architecture to allow system designers to improve overall image quality, or to relax system tolerances to achieve lower cost. The excellent uniformity of the KAF-09000 image sensor improves overall image integrity by simplifying image corrections, while integrated anti-blooming protection prevents image bleed from over-exposure in bright areas of the image. To simplify device integration, the KAF-09000 image sensor uses the same pin-out and package as the KAF-16801 image sensor.
The sensor utilizes a Transparent Gate Electrode to improve sensitivity compared to the use of a standard front side illuminated polysilicon electrode.

• Transparent Gate Electrode for high sensitivity
• Large Pixel Size
• Large Image Area
• High Quantum Efficiency
• Low Noise Architecture
• Broad Dynamic Range